Disilane can be diluted with argon, helium, hydrogen
or nitrogen in order to provide concentrations of less than 100%.
Using disilane in this form can add an additional degree of control
to the process, particularly when relatively small amounts of silicon
are to be deposited. Mixtures are analyzed prior to shipment to ensure
that the concentration is in the range requested. Disilane mixtures
are prepared as ordered. Concentrations other than those listed below
are available upon request.