Electronic Gases
The fast-paced semiconductor industry puts very specialized demands on electronic gases. When you consider that even the most minute impurities can cause defects in submicron geometries, the choice of gas, specification and gas supplier become of vital importance. Hong Kong Specialty Gases is committed to become the world's leading supplier of electronic gases to the semiconductor industry. As the key part of the worldwide network of companies supplying electronic gases, Hong Kong Specialty Gases can supply complete line of products of highest quality to meet customer's individual requirements. Our selected vendors must focus exclusively with expertise on electronic gases and mostly under ISO9002 certified quality system.

To ensure the cleanliness of the cylinder to maintain the purity of its content, extraordinary procedures including, grit-blasting, metallic coating with proprietary process, visual inspection, vacuum-baking, additional chemical treatment, inert gas purging, re-baking must be employed and some may be repeated many times until the desired level of purity is achieved. The entire process is tightly controlled from start to finish so you are assured of a consistent and reliable supply. With the use of world class latest analytical equipment, our ULSI grade gases are analyzed to part per billion purity level and the final analytical results are appeared on each certificate of analysis that accompanies every order. Our process of continuous improvement will help benefit our customers by supplying them with the best, safest and most reliable products.


AMMONIA NH3

ARGON Ar

ARSINE AsH3

ARSINE ASH3 MIXTURES

BORON TRICHLORIDE BCl3

BORON TRIFLUORIDE BF3

CARBON DIOXIDE CO2

CHLORINE Cl2

CHLORINE TRIFLUORIDE ClF3

DIBORANE B2H6 MIXTURES

DICHLOROSILANE SiH2Cl2

DIETHYLTELLURIDE (C2H5)
2TE MIXTURES

DIMETHYLZINC (CH3)2ZN MIXTURES

DISILANE Si2H6

DISILANE SI2H6 MIXTURES

GERMANE GeH4

GERMANE GEH4 MIXTURES

HALOCARBON 14
(CARBON TETRAFLUORIDE,
TETRAFLUOROMETHANE) CF4

HALOCARBON 14 / OXYGEN MIXTURE

HALOCARBON-23
(TRIFLUOROMETHANE, FLUOROFORM)
CHF3

HALOCARBON-116
(HEXAFLUOROETHANE) C2F6

HALOCARBON-318
(OCTAFLUOROCYCLOBUTANE) C4F8

HELIUM He

HYDROGEN H2

HYDROGEN BROMIDE HBr

HYDROGEN CHLORIDE HCl

HYDROGEN SELENIDE H2Se

HYDROGEN SELENIDE H2SE MIXTURES

ION IMPLANTATION GASES

LED AMMONIA NH3

NITROGEN N2

NITROUS OXIDE N2O

NITROGEN TRIFLUORIDE NF3

OXYGEN O2

PHOSPHINE PH3

PHOSPHINE PH3 MIXTURES

PHOSPHORUS PENTAFLUORIDE PF5

SILANE SiH4

SILANE SIH4 MIXTURES

SILICON TETRACHLORIDE SiCl4

SILICON TETRAFLUORIDE SiF4

SULFUR HEXAFLUORIDE

TRICHLOROSILANE SiCl3H

TUNGSTEN HEXAFLUORIDE WF6